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Evonik is the world's largest supplier of fumed metal oxide particles, with a proven track record in supplying the semiconductor industry abrasive particles for CMP. With electronic grade manufacturing available in all the industry growth markets, Evonik has the local resources available to develop the particle solutions you require. With over a decade of experience in supplying the CMP industry, we understand the special requirements and speak the language of our customers.
Whether your objective is to improve process yield and efficiency in an existing application, or if you are targeting slurry development for the next-generation metal CMP or node size, Evonik has the capabilities and experience necessary to supply AEROSIL® and AEROXIDE® products that satisfy the stringent requirements of semiconductor applications.
Evonik AEROSIL® and AEROXIDE® have the broadest pipeline of developmental nano-structured products available. A range of developmental fumed metal oxides, mixed metal oxides, and surface-treated metal oxides are available to assist our clients to keep pace with the International Technology Roadmap for Semiconductors (ITRS). We primarily focus our innovation on the abrasive particle. Depending on your preference these are supplied as powders or masterbatch dispersions, which can be easily converted into a CMP slurry.
Evonik’s IDISIL® colloidal silica marks an extension of the portfolio, with the primary goal to become a leading supplier of tailored colloidal abrasives for next generation CMP slurries. We are expanding into this product group and engage in collaborative developments with the manufacturers of CMP slurries.
Contact us to discover how partnering a company with over 70 years of expertise in the design of nanostructured particles can benefit you.
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Product- as well as safety data sheets (SDS) of our various AEROSIL® fumed silica grades, can be found at our product recommendationsmore